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Nanoscribe's 3D laser lithography systems are designed for the fabrication of true three-dimensional micro- and nanostructures in various commercially available photoresists. This unique performance is based on multiphoton-absorption: Ultra-short laser pulses expose pre-defined 3D micro- and nanostructures, which finally after development result as self-supporting structures anchored to a substrate.

The herewith routinely achieved feature sizes are typically smaller than 150 nm – depending on the photoresist used. Microscope objectives and the scanning stage will be especially configured for the particular field of application. This way, a structuring depth of up to 300 µm on an area of 100x72 mm² at most is realizable.

The desired structures can either be created with common CAD software (importable formats: DXF, STL) or alternatively with Nanoscribe’s specialized general writing language (GWL). As a special feature the software with its simple programming language provides full access to all adjustable system parameters.

Material makes the difference: Numerous photosensitive materials can be structured via 3D laser lithography, mostly polymers. Furthermore, Nanoscribe offers in-depth knowledge at the casting of 3D structures into metals, semi-conductors and SiO₂.