Nanoscribe GmbH - True 3D Laser Lithography

Direct laser writing solutions for research, development and low volume production

Nanoscribe GmbH
Hermann-von-Helmholtz-Platz 1
76344 Eggenstein-Leopoldshafen
Germany
Fon: +49 721 60 82 88 40
Fax: +49 721 60 82 88 48
E-Mail: info@nanoscribe.de

Scientific Articles

Year: 2013 | 2012 | 2011 | 2010 | 2009 | 2008 | 2007 | 2006 | 2005 | 2004 |

Arsenic trisulfide inorganic photoresist for three-dimensional photolithography
Author: S. Wong
Publication source: urn:nbn:de:swb:90-90845
Spatially localized photoluminescence at 1.5 micrometers wavelength in direct laser written 3D structures
Authors: S. Wong, O. Kiowski, M. Kappes, J.K. Lindner, N. Mandal, F.C. Peiris, G.A. Ozin, M. Thiel, M. Braun, M. Wegener, and G. von Freymann
Publication source: Adv. Mater. 20, 4097-4102 (2008)
Photonic metamaterials by direct laser writing and silver chemical vapour deposition
Authors: M.S. Rill, C. Plet, M. Thiel, I. Staude, G. v. Freymann, S. Linden, and M. Wegener
Publication source: Nature Mater. 7, 543-546 (2008)
Related Articles: Pro-Physik (May 08), Materials Today (July 08), MRS Bulletin (Sept. 08)