Nanoscribe GmbH - True 3D Laser Lithography
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Technology

TechnologyNanoscribe's technology for the fabrication of three-dimensional micro- and nanostructures of photo-sensitive materials is based on "direct laser writing", i.e., a non-linear two-photon absorption process. Learn more about technical backgrounds on the following pages:

Conferences


Forthcoming exhibitions and conferences presenting Nanoscribe's 3D Laser Lithography system:

Semicon Taiwan 2010

Taipei, Taiwan
September 8-10, 2010
Booth: 2334


Metamaterials 2010

Karlsruhe, Germany
September 13-16, 2010


MNE 2010

Genoa, Italy
September 19-22, 2010
Booth: S5


PECS 2010

Granada, Spain
September 26-30, 2010
Booth 11


NanoBioTech 2010

Montreux, Switzerland
November 15-17, 2010