Photoresists
- IP Photoresists
Acryl based photoresists for todays increasing requirements. Best features: Highest resolution, reproducibility and mechanical stability.
Further information about IP resists... - Chalcogenide Glass (As2S3)
Samples coated with this amorphous semiconductor as well as the appropriate etchant for 3D resolution can be received from Nanoscribe. As2S3 offers interesting optical and mechanical properties.
Further information about chalcogenide glasses... - SU-8 (25, 50, 100)
The resists of the SU-8 series are common negative resists provided by MicroChem Corp. These resists are commercially available, inexpensive and their handling is unpretentious. - Ormocere
These organically modified ceramics are developed by the Fraunhofer-Institut für Silicatforschung (ISC) Würzburg, Germany. Please refer to www.ormocer.de for detailed information. - PDMS
Polydimethylsiloxane is a silicon-based organic polymer with variable physical properties. This viscoelastic and inert resist is biocompatible and particularly applicable in life-sciences. - AZ MiR 701, AR-P-3120
Thin film positive resists used in semiconductor industry for 2D structuring. - AZ 5214
Thin film negative resist for 2D structuring.
Nanoscribe evaluates and develops additional photoresists for 2D and 3D applications.





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