Home

Nanoscribe produces compact and easy-to-operate table-top laser lithography systems, allowing for true three-dimensional nanostructures in commercially available photoresists. Furthermore, we provide photoresists specially developed for the needs of 3D laser lithography from in-house developments: IP-L, IP-G as well as As2S3. Finally, we also offer advice in casting 3D polymer templates into metals or semiconductors.

News from Nanoscribe GmbH

  • Candidate for the "Deutsche Zukunftspreis 2010"
    Candidate for the

    The committee´s offices of the "Deutscher Zukunftspreis" announced, that Nanoscribe has been nominated by the German Federal Ministry of Education and Research as candidate for the "Deutsche Zukunftspreis 2010" with the subject "Laserlithography of three-dimensional nanostructures for photonics and life-sciences". Following a thorough preselection Nanoscribe was proposed as one out of 20 German teams competing for the German Federal Ministry´s price of Education and Research. The nomination itself already is a vast success for the young company.

    The Deutsche Zukunftspreis, also considered as the German "Oscar of innovation", has been awarded thirteen times by the Federal President. The next awards ceremony will be on December, 1, 2010. 

  • CLEO 2010 (Mai 18 - 20, 2010)
    CLEO 2010 (Mai 18 - 20, 2010)

    Nanoscribe GmbH presents itself and its products at the CLEO 2010 in San Jose, California (USA). From Mai 18th to 20th we inform you at our booth 2029 about our 3D laser lithography systems for the structuring of a large variety of photoresists as well as technologies for the transformation of structures into additional other materials. We are going to have a demonstration system on site to show its functionality and its very user friendly operation. Please feel invited to take the opportunity to discuss your particular requirements in the field of micro- and nanostructuring with us.

  • SPIE Photonics West 2010 (January 26 - 28, 2010)

    Visit us at Photonics West from January 26th to January 28th 2010. We are presenting our systems and services at booth 4314. Our presentation is focused on our 3D laser lithography solutions and their versatile possible fields of application. We would like to hear and discuss your individual requirements on nano- and microstructuring technologies.

  • NanoBioTech, Montreux (November 16 - 18, 2009)
    NanoBioTech, Montreux (November 16 - 18, 2009)

    Applications in life sciences take center stage at the participation of Nanoscribe GmbH at the concomitant exhibition at NanoBioTech at Montreux (Switzerland) from November 16th to 18th. The fabrication of three-dimensional structures for applications in cell biology as well as the realization of microfluidic devices will be demonstrated and appropriate materials for biological applications will be presented. Convince yourself of the facile implementation of your ideas to three-dimensional devices.

  • MNE 2009, Ghent (September 28 - October 01, 2009)
    MNE 2009, Ghent (September 28 - October 01, 2009)

    Our 3D Laser Lithography Systems as well as our proprietary IP photoresists which are specifically designed for three-dimensional nanostructuring are continuously expanding the constraints towards smaller linewidths and lattice constants. Nanoscribe GmbH is going to present its current DLW systems, photoresists and services at Micro & Nano Engineering (MNE) 2009 in Ghent (Belgium) from September 28th to October 01st at booth 4. You are cordially invited to use this opportunity to inform yourself of the versatile fields of applications of three-dimensional direct laser writing at the technological leader. We are very much looking forward to your visit!

  • Innovation Award Finalist
    Innovation Award Finalist

    Nanoscribe's application for this year's innovation award at the CLEO 2009 in Baltimore, MD (USA), was forwarded to the finalists. The title was "Three-dimensional Micro- and Nanostructuring by Direct Laser Writing".

  • LASER 2009, Munich (June 15 - 18, 2009)
    LASER 2009, Munich (June 15 - 18, 2009)

    Nanoscribe GmbH presents itself and its products at the LASER World of PHOTONICS in Munich, Germany. From June 15nd to June 18th 2009 we inform you in hall C1, booth 347 about our 3D laser lithography systems for the exposure of a variety of photoresists as well as technologies for the transformation of structures into different additional materials.  Convince yourself of the ease of producing complex 3D structures directly at an exhibited system. Please feel invited to take the opportunity to discuss your particular needs in the field of micro- and nanostructuring with us. Don't forget to take your voucher for some structures with you. This voucher can be found in the 'Messekurier'. We are looking forward to your visit!

  • CLEO 2009 (June 02 - 04, 2009)
    CLEO 2009 (June 02 - 04, 2009)

    Nanoscribe GmbH presents itself and its products at the CLEO 2009 in Baltimore, Maryland (USA). From June 2nd to June 4th we inform you at our booth 1235 about our 3D laser lithography systems for the exposure of a variety of photoresists as well as technologies for the transformation of structures into different additional materials. This will be the first exhibition where we will have a system for demonstration on site to show its very facile operation. Please feel invited to take the opportunity to discuss your particular needs in the field of micro- and nanostructuring with us.

  • SPIE Photonics West 2009 (January 27 - 29, 2009)
    SPIE Photonics West 2009 (January 27 - 29, 2009)

    Visit us at Photonics West from January 27th to January 29th 2009. We are presenting our systems and services at booth 6711. Our presentation is focused on our 3D laser lithography solutions and their versatile possible fields of application. We would like to hear and discuss your individual requirements on nano- and microstructuring technologies.

  • ASCB - Annual Meeting 2008 (December 13 - 17, 2008)
    ASCB - Annual Meeting 2008 (December 13 - 17, 2008)

    We are presenting our products and services at the annual meeting of the American Society for Cell Biology in San Francisco (USA). From December 13th to 17th 2008 we are presenting our laser lithography systems and applications in the area of life sciences.  We are looking forward to welcome you at booth 2227.

12


Nanoscribe GbR


Disclaimer




Deutsch English 日本語
 
True 3D Laser Lithography True 3D Laser Lithography