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Nanoscribe produces compact and easy-to-operate table-top laser lithography systems, allowing for the fabrication of true three-dimensional nanostructures based on two photon polymerization in commercially available photoresists. Furthermore, we provide photoresists specially developed for the needs of 3D laser lithography (also known as Direct Laser Writing) from in-house developments: IP-L as well as IP-G. Finally, we also offer advice in casting 3D polymer templates into metals or semiconductors.
Recent News
- Dip-in Laser Lithography (DiLL)
With our innovative and patent-pending DiLL technology, users of Nanoscribe's Photonic Professional systems can now fabricate high-resolution 3D micro- and nanostructures far taller than the working distance of the objective lens. Using Nanoscribe's dedicated photoresists, constant quality with sub-micrometer resolution is realized over the full fabrication height. Fore more information, please contact our sales team.
- Nanoscribe is CyberChampion 2011
We were recently awarded with a special award in the category "Spin-off companies from universities / research centers" at the CyberChampions Awards 2011/12. The price is sponsored by tech-solute and endowed with 1,500 euros.
We invite you to view our news report with photos.
- Newsletter (Sept 2011)
In the new edition of Nanoscribe’s “News and Reviews” you find the latest developments in 3D laser lithography. We present a novel concept for writing tall nanostructures – DiLL, integration of nanofluidic channels into microfluidic channels, two component scaffolds fabrication for controlled cell culture and our updated photoresist – IP 780.
Copyright © 2012 by Nanoscribe GmbH 
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