2D photonic applications benefit from the high resolution enabled by the two-photon polymerization of Nanoscribe’s laser lithography systems. Depending on the photochemistry of resists used and the focusing optics minimum feature sizes of about 150 nm can be achieved. This bridges the gap between electron beam lithography and direct laser writing systems based on 1-photon absorption. Examples of applications include – among others - diffractive optical elements (DOEs) and gratings, metamaterials, optical security labels, optical waveguides as well as biomimetics. Please click on the thumbnails to open a detailed view and the corresponding figure captions.