Dip-in Laser Lithography (DiLL)
With its patent-pending dip-in laser lithography (DiLL) technology, Nanoscribe pushes the frontiers of 3D nano lithography: DiLL enables the Photonic Professional to break the conventional restrictions on structure height caused by the limited working distance of high-resolution microscope objectives. Retaining our renowned high resolution in the sub-micrometer range, DiLL opens up a multitude of demanding applications, e.g., in the fields of micro optics or mechanical metamaterials.
Optimized substrates and photoresists that were specifically engineered for DiLL allow for automated fabrication processes and easy handling – even for untrained users. By completely eliminating the need for power compensation and focus correction, DiLL vastly simplifies the realization of your visions.
Upgrading your Photonic Professional will allow you to fabricate structures with theoretically unlimited height while maintaining constant resolution over the full structure height. Incredibly high aspect ratios have thus become feasible that have previously been unheard of in optical lithography.
Copyright © 2012 by Nanoscribe GmbH 
Sitemap
Kontakt / Contact
Top
Print
Login