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Photoresists

Following list of exemplified photoresists and photosensitive materials is frequently used for the process of two-photon polymerization and material structuring:

• IP Photoresists
  Acryl based photoresists for todays increasing requirements. Best features: Highest resolution, reproducibility and mechanical stability.
  Further information about IP resists...
• Chalcogenide Glass (As₂S₃)
  As₂S₃ offers interesting optical properties and can be evaporated as an amorphous semiconductor onto substrates.
  
• SU-8 (25, 50, 100)
  The resists of the SU-8 series are common negative resists provided by MicroChem Corp. These resists are commercially available, inexpensive, and easy to handle.
• Ormocere
  These organically modified ceramics are developed by the Fraunhofer-Institut für Silicatforschung (ISC) Würzburg, Germany. Please refer to www.ormocer.de for detailed information.
• AZ MiR 701, AR-P-3120
  Thin film positive resists used in semiconductor industry for 2D structuring.
• AZ 5214
  Thin film negative resist for 2D structuring.
   

Nanoscribe evaluates and develops additional photoresists for 2D and 3D applications.