Nanoscribe GmbH - True 3D Laser Lithography
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Core Competencies

Nanoscribe Competences Photonic Professional NanostructuresThe technology of Nanoscribe allows for laser lithographic fabrication of three-dimensional (3D) micro- and nanostructures in one single exposure step. A photosensitive material is illuminated using a tightly-focused short-pulsed laser beam. With this technique it is possible to realize almost arbitrarily-shaped 3D structures with feature sizes down to 150 nm.

The attainable quality and the success of this technique are based on  more than 10 years of research and development. First insights have been gained  at the Karlsruhe Institute of Technology (KIT), formerly Universität Karlsruhe (TH) and Forschungszentrum Karlsruhe. The technological leadership is based on an optimized optical setup, the development of copyright protected software, as well as the optimization of the complete nano- and microfabrication process.

Nanoscribe 3D Laserlithography Competencies

Direct laser writing is possible for a wide range of UV-curable photoresists with different properties like SU-8, AZ resists, Ormoceres and our proprietary high-resolution IP-photoresists (IP-L 780, IP-G 780, IP-Dip). 

However, many 3D microstructures obtain their functionality from casting or coating of the polymer templates with, e.g., silicon or metals. Related processes have been extensively studied by us as well as our customers. The essential importance of these processes for optical applications is  highlighted by recent publications.

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