Nanoscribe GmbH - True 3D Laser Lithography
/: Applications > 2D Photonics
Deutsch English 日本語 Chinese

2D Photonics

Shown below is a series of structures fabricated by means of the direct laser writing process with our systems. Click on the thumbnails to open a detailled view.

 

4x4 mm² array of lines on a 170 µm thin glass substrate.
Tilted gratings.
Tilted gratings.
Split-ring resonators written into the negative-tone photoresist SU-8.
High aspect ratio pillars written into the negative tone photoresist SU-8.
Cross-grid written into the negative tone resist AZ 5214E.
Cross-grid written into the positive tone resist AZ MiR 701.
Lines written into the negative-tone photoresist SU-8.
Grating with 300nm periodicity and sub-90nm-linewidth; material: IP-L

Conferences

Forthcoming exhibitions and conferences presenting Nanoscribe's 3D Laser Lithography system:



NanoTech 2012

Tokyo (JP)
February 15-17, 2012
Booth: B-34

Semicon China 2012

Shanghai (CN)
March 20-22, 2012
Booth: E3-3123-1

CLEO 2012

San Jose, CA (USA)
May, 08-10, 2012
Booth: 2315

4th International Symposium

Interface Biology of Implants
Rostock (DE)
May 09-11, 2012