Nanoscribe GmbH - True 3D Laser Lithography
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Casting in metal or silicon

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So far, we have shown the ability of the "Photonic Professional" for the fabrication of complex 3D micro- and nanostructures. Most of them are based on materials capable of 2-photon absorption process, such as photoresists or amorphous semiconductor As2S3. These structures can also be inverted to many other different materials, e.g. metal, silica, silicon or PDMS, by casting techniques. Examples of some casting processes and results achieved with these techniques can be found in the following subordinate categories: 

If you have any questions concerning the casting techniques, please feel free to contact us.


Conferences


Forthcoming exhibitions and conferences presenting Nanoscribe's 3D Laser Lithography system:



ICNP 2012

Beijing (CN)
May 27-30, 2012


EUSPEN

Stockholm (SE)
June 05
-07, 2012
Booth: 1a


ISMM 2012

Hsinchu (TW)
June
10-13, 2012


Nanotech China 2012

Shanghai (CN)
June
11-13, 2012
Booth: 265


EMBL 2012

Heidelberg (DE)
July
25-27, 2012


3M Nano 2012

Xi´an (CN)
Aug 29-Sept 01, 2012