Core Competencies
The technology of Nanoscribe allows for laser lithographic fabrication of three-dimensional (3D) micro- and nanostructures in one single exposure step. Therefore, a photosensitive material is illuminated by using a tightly-focused short-pulsed laser beam. With this technique it is possible to realize nearly arbitrarily-shaped 3D structures with feature sizes downto 150 nm. Smaller features could be obtained by our own development or by other providers of photoresists.
The attainable quality and the success of this technique are based on more than 10 years of research and development. First insights have been gained at the Karlsruhe Institute of Technology (KIT) (formerly Universität Karlsruhe (TH) and Forschungszentrum Karlsruhe). The leadership in technology relies on the expertise on optimizing the optical setup, the development of copyright protected software, as well as the optimization of the writing and chemical development processes.
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The direct writing into photosensitive materials is possible for a wide range of resists with fundamentally different properties, e.g., organic and anorganic, biocompatible, and biodegradable materials like SU-8, AZ resists, or Ormoceres. Besides these resists having a low index of refraction, Nanoscribe also offers a compatible highly-refracting material (As2S3, i.e., chalcogenide glass) and two acrylic photoresists with an extraordinarily high resolution.
However, many 3D structures obtain their functionality from casting or coating the poylmer templates with, e.g., silicon or metal. Related processes have been extensively studied by the employees. The essential importance of these processes for optical investigations is highlighted by recent publications.
Beyond our core competences, Nanoscribe provides expertise and consulting capabilities in electroplating / galvanization in cooperation with microworks GmbH.
Copyright © 2012 by Nanoscribe GmbH 
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