Products

Our standard laser lithography system routinely achieves 150 nm linewidth in a standard sample volume of 300 μm x 300 μm x 80 μm (depending on microscope objective and scanner configuration, other dimensions on request).

Structures can be designed either in CAD software supporting the DXF format or directly be implemented within our script language (GWL) providing full access to all instrument features.

Designed for the high demands of three-dimensional photonic crystal structures, the instrument is also your choice for, e.g., generating three-dimensional scaffolds for biology, micro- and nanofluidic circuitry. We are pleased to send you a product info brochure on request.