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Nanoscribe's technology for the fabrication of three-dimensional micro- and nanostructures of photo-sensitive materials is based on "direct laser writing", i.e., a non-linear two-photon absorption process. Learn more about technical backgrounds on the following pages:
Forthcoming exhibitions and conferences presenting Nanoscribe's 3D Laser Lithography system:
Tokyo (JP)
February 15-17, 2012
Booth: B-34
Shanghai (CN)
March 20-22, 2012
Booth: E3-3123-1
San Jose, CA (USA)
May, 08-10, 2012
Booth: 2315
Interface Biology of Implants
Rostock (DE)
May 09-11, 2012
Copyright © 2012 by Nanoscribe GmbH 
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