Photoresists
Following list of exemplified photoresists is frequently used for the process of two-photon polymerization:
IP Photoresists
Acryl based photoresists for todays increasing requirements. Best features: Highest resolution, reproducibility and mechanical stability.
Further information about IP resists...- Chalcogenide Glass (As2S3)
As2S3 offers interesting optical and mechanical properties and can be evaporated as an amorphous semiconductor onto substrates.
- SU-8 (25, 50, 100)
The resists of the SU-8 series are common negative resists provided by MicroChem Corp. These resists are commercially available, inexpensive, and easy to handle. - Ormocere
These organically modified ceramics are developed by the Fraunhofer-Institut für Silicatforschung (ISC) Würzburg, Germany. Please refer to www.ormocer.de for detailed information. - AZ MiR 701, AR-P-3120
Thin film positive resists used in semiconductor industry for 2D structuring. - AZ 5214
Thin film negative resist for 2D structuring.
Nanoscribe evaluates and develops additional photoresists for 2D and 3D applications.





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