Photoresists

• IP Photoresists
  Acryl based photoresists for todays increasing requirements. Best features: Highest resolution, reproducibility and mechanical stability.
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• Chalcogenide Glass (As₂S₃)
  Samples coated with this amorphous semiconductor as well as the appropriate etchant for 3D resolution can be received from Nanoscribe. As₂S₃ offers interesting optical and mechanical properties.
  Further information ...
• SU-8 (25, 50, 100)
  The resists of the SU-8 series are common negative resists provided by MicroChem Corp. These resists are commercially available, inexpensive and their handling is unpretentious.
• Ormocere
  These organically modified ceramics are developed by the Fraunhofer-Institut für Silicatforschung (ISC) Würzburg, Germany. Please refer to www.ormocer.de for detailed information.
• PDMS
  Polydimethylsiloxane is a silicon-based organic polymer with variable physical properties. This viscoelastic and inert resist is biocompatible and particularly applicable in life-sciences.
• AZ MiR 701, AR-P-3120
  Thin film positive resists used in semiconductor industry for 2D structuring.
• AZ 5214
  Thin film negative resist for 2D structuring.
   

Nanoscribe evaluates and develops additional photoresists for 2D and 3D applications.