News and Reviews (Mai 2015)

New IP-S photoresist for large volumes

Although a variety of different materials can be used with Photonic Professional systems, Nanoscribe offers tailor-made photoresists to its customers. These negative-tone resists provide maximum 3D-printer performance with respect to resolution, writing speed, structural accuracy, and ease of use along the process chain. The new IP-S is a resist for large volume structures and for structures where a smooth surface is required.


  • Easy processing:

     > drop-casting of the photoresist
     > no spin-coating
     > no pre-/post exposure bake

  • Smooth surfaces
  • Little shrinkage
  • Fast writing
  • Good adhesion to various substrates