Invitation: Symposium Nanolithography
On March 13, 2019, the 2nd European Symposium on Direct Write, Optical, Ion and Electron Beam Lithography will be held at IST Austria. Technical experts from Heidelberg Instruments, micro resist technology, Raith, and Nanoscribe will gather together with customers, researchers and microfabrication experts to discuss challenges and advanced solutions with direct-write capabilities.
Have a look at the agenda here: Agenda IST Symposium
The technical program ranges from plasmonics, photonics and optics to biomimetics and polymer research. We cordially invite you to join this event! Participation is free for registered, academic attendees. The fee for participants from industry is 250 Euro.
Register using this web form: Registration IST SymposiumShare this site on facebook