Newsletter (Sept 2011)

September 15,2011

92011.jpgIn the new edition of Nanoscribe’s “News and Reviews” you find the latest developments in 3D laser lithography. We present a novel concept for writing tall nanostructures – DiLL, integration of nanofluidic channels into microfluidic channels, two component scaffolds fabrication for controlled cell culture and our updated photoresist – IP 780.