News and Reviews (Sept 2018)

From Flat to Relief – Advanced Fabrication from Meso to Nano


Symposium at Stanford University

Nanoscribe Newsletter 08_18 Stanford Symposium
Dr. Roger Howe at the symposium at Stanford University.

The Stanford Nanofabrication Facility (SNF) opened its doors for the ‘Direct-Write Symposium Advanced Fabrication from Meso to Nano’ at the Stanford University in California, United States. On July 13th, 2018, lithography experts from the National Nanotechnology Coordinated Infrastructure (NNCI) network, specialists of nano- and microfabrication instrumentation from Nanoscribe, Carl Zeiss Microscopy, Heidelberg Instruments, SwissLitho, Raith and Alvéole as well as micro- and nanotechnology professionals from academia and industry gathered at this multidisciplinary event.

The attendees discussed recent advances on high-precision fabrication techniques for nanostructures and microsystems with presentations about gray scale lithography, additive microfabrication, focused ion beam lithography and maskless quantitative photopatterning. The discussions concentrated specially on new strategies of nano- and microlithography beyond planar approaches for the realization of 2.5D relief structures and true 3D volume designs.

Our 3D microprinting expert Dr. Benjamin Richter took part in this event, contributing with his expertise of more than eight years in the field of two-photon polymerization for applications in 3D cell scaffolds and tissue engineering. He presented an introduction to Nanoscribe’s 3D microprinting technology with a focus on recent life sciences applications and provided insights on how 3D printers transform the production of micro-optics and integrated photonics benefiting from sub-micrometer precision.

The organizing committee is planning the next edition of the symposium for summer 2019. The event welcomes attendees from and outside of the US, from science and industry and will open registrations on SNF website and social media.