Nanoscribe GmbH - True 3D Laser Lithography
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Nanoscribe produces compact and easy-to-operate table-top laser lithography systems, allowing for true three-dimensional nanostructures in commercially available photoresists. Furthermore, we provide photoresists specially developed for the needs of 3D laser lithography (also known as Direct Laser Writing) from in-house developments: IP-L, IP-G as well as chalcogenide glasses. Finally, we also offer advice in casting 3D polymer templates into metals or semiconductors.

Press Releases and Events

  • Candidate for the Deutscher Zukunftspreis
    Candidate for the Deutscher Zukunftspreis

    The committee´s offices of the "Deutscher Zukunftspreis" announced, that Nanoscribe has been nominated by the German Federal Ministry of Education and Research as candidate for the "Deutsche Zukunftspreis 2010" with the subject "Laserlithography of three-dimensional nanostructures for photonics and life-sciences".

    Following a thorough preselection Nanoscribe was proposed as one out of 20 German teams competing for the German Federal Ministry´s price of Education and Research. The nomination itself already is a vast success for the young company.

    The Deutsche Zukunftspreis, also considered as the German "Oscar of innovation", has been awarded thirteen times by the Federal President. The next awards ceremony will be on December, 1, 2010.



Conferences


Forthcoming exhibitions and conferences presenting Nanoscribe's 3D Laser Lithography system:

Semicon Taiwan 2010

Taipei, Taiwan
September 8-10, 2010
Booth: 2334


Metamaterials 2010

Karlsruhe, Germany
September 13-16, 2010


MNE 2010

Genoa, Italy
September 19-22, 2010
Booth: S5


PECS 2010

Granada, Spain
September 26-30, 2010
Booth 11


NanoBioTech 2010

Montreux, Switzerland
November 15-17, 2010