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Nanoscribe produces compact and easy-to-operate table-top laser lithography systems, allowing for the fabrication of true three-dimensional nanostructures based on two photon polymerization in commercially available photoresists. Furthermore, we provide photoresists specially developed for the needs of 3D laser lithography (also known as Direct Laser Writing) from in-house developments: IP-L as well as IP-G. Finally, we also offer advice in casting 3D polymer templates into metals or semiconductors.
Recent News
- Newsletter (April 2012)
In the current edition of Nanoscribe’s “News and Reviews” we would like to provide you with information on a high-impact application on helical micromachines of our customer, the ETH-Zürich (CH), written with the Photonic Professional. We also present the new features and improved usability of our control software, NanoWrite 1.6. In the news ticker you´ll find more information about current developments and exhibitions. The newsletter can either be downloaded as a .pdf or you can follow this link.
- Dip-in Laser Lithography (DiLL)
With our innovative and patent-pending DiLL technology, users of Nanoscribe's Photonic Professional systems can now fabricate high-resolution 3D micro- and nanostructures far taller than the working distance of the objective lens.
Copyright © 2012 by Nanoscribe GmbH 
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